MKS AX7670-85 0190-47768 – HOT INQUIRY SPARE PART

MKS AX7670-85 (0190-47768) is an ASTRON®i reactive gas generator for Applied Materials HDP CVD semiconductor process tools. It generates reactive plasma gas without mandatory argon ignition, supporting multiple process gases to improve wafer throughput and reduce cycle time. This unit is a critical spare for thin-film deposition in fabs and is receiving frequent inquiries recently.

Technical Specifications

| Manufacturer | MKS / AMAT OEM Part |
| — | — |
| Model | AX7670-85, 0190-47768 |
| Product Type | ASTRONi Reactive Gas Generator |
| Compatible Tool | AMAT HDP CVD System |
| Max Flow Range | 0 ~ 1000 sccm |
| Pressure Rating | 0 ~ 1000 Torr |
| Accuracy | ±0.5 % FS |
| Supported Process Gas | SiH4, NH3, N2, H2, O2 |
| Key Feature | No argon required for ignition |
| Application Field | Semiconductor thin film deposition |

Application

Mainly used on Applied Materials HDP CVD chambers for dielectric deposition on 200mm / 300mm silicon wafers in semiconductor manufacturing. It delivers stable plasma source control to maintain consistent film quality for high-volume wafer fabrication.

Inquiry Note

MKS AX7670-85 0190-47768 is one of our trending hot inquiry spare parts. Reach out to us for price, stock status, refurbishment options, lead time or datasheet if you have an RFQ.