MKS AX7670-85 0190-47768 – HOT INQUIRY SPARE PART

MKS AX7670-85 (0190-47768) is an ASTRON®i remote plasma / reactive gas generator, OEM part for Applied Materials HDP CVD semiconductor process tools. Built on patented low-field toroidal plasma technology, it generates dissociated reactive gas without mandatory argon ignition, supporting multiple process gases to boost wafer throughput and shorten chamber clean cycle time. It is a critical high-value spare for thin-film deposition fab equipment and has received frequent inquiries recently.

Technical Specifications

| Manufacturer | MKS / ASTEX, AMAT OEM Part |
| — | — |
| Model | AX7670-85, AMAT PN: 0190-47768 |
| Product Type | ASTRONi Reactive Gas Remote Plasma Source |
| Compatible Tool | Applied Materials HDP CVD System |
| Power Input | 208 VAC, 3 Phase, 30A, 50/60 Hz |
| Max Gas Flow Range | 0 ~ 1000 sccm |
| Working Pressure Range | 0 ~ 1000 Torr |
| Measurement Accuracy | ±0.5 % Full Scale |
| Supported Process Gas | NF3, SiH4, NH3, N2, H2, O2 |
| Cooling Method | Water cooling |
| Key Feature | No argon required for plasma ignition |
| Operating Temp | -20℃ ~ +50℃ |
| Application Field | Semiconductor wafer thin film deposition & chamber cleaning |

Application

It is installed on AMAT HDP CVD chambers for 200mm / 300mm silicon wafer fabrication. It supplies stable dissociated fluorine species for chamber cleaning and dielectric film deposition, reducing in-chamber plasma damage and extending chamber component service life for high-volume semiconductor production lines.

Inquiry Note

MKS AX7670-85 0190-47768 remains one of our trending hot inquiry semiconductor spare parts. Reach out to us for price, stock status, refurbished availability, lead time or datasheet when you submit your RFQ.